Process for the Production of Multicoat Protective and/or Decorative Coatings on Substrate Surfaces U.S. Patent 5,512,322. Apr. 30,. 1996 H-D. Hi//e et al, assignors to BASF Lacke & Farben Akt., Germany

A process for the production of a multi- coat coating on a substrate surface com- prising applying an aqueous dispersion of a basecoat composition wherein the basecoat includes a polyurethane resin, a pigment; forming a basecoat on the substrate sur- face; applying a topcoat composition to the basecoat; and baking the topcoat and basecoat.

Aluminum Etching U.S. Patent 6513,766. May 7, 1996 R.L. Ranieri and F! Pate/, assignors to Sandoz Ltd., Basle, Swifzerland

A process for etching an aluminum or aluminum alloy article comprising treating the article in a caustic alkali metal hydrox- ide etching bath at a caustic concentrate of 20-120 g/L and a temperature of 70-17O”F, said etching bath also containing O.l-2.0%

by weight of an anionic surfactant of the sulfate or sulfonate type.

Carbon Dioxide Cleaning System U.S. Patent 5,514,024. May 7, 1996 L.N. Goenka, assignor to Ford Motor Co., Dearborn, Mich.

A nozzle for enhanced mixing in a car- bon dioxide cleaning system.

Surface Treatment Composition U.S. Patent 5514,217. May 7, 1996 G.P. Marks and W.E Marwick, assignors to A/can Mernational Ltd., Canada

A coating composition suitable for ap- plication to a surface to improve the adhe- sion properties of the surface, consisting essentially of a binder, which is a tetraalkyl silicate or a monomeric or oligomeric hy- drolysis product thereof, an inorganic oxide below 100 nm primary particle diameter, and optionally at least one component se- lected from the group consisting of corro- sion inhibitors, surfactants, adhesion pro- moters, markers, catalysts for chain extension and cross-linking of the binder,

and hydrogen peroxide, all in dispersion in a fluid aqueous medium consisting of water containing up to 30% by volume of a polar organic liquid at least partially miscible with water.

Cold Cleaning Process U.S. Patent 5,514,221. May 7, 1996 M.S. Bolmer, assignor to Nf Atochem North America Inc., Philadelphia

A method for cold cleaning of an object, which comprises the steps of contacting in an open environment with a nonazeotropic solvent blend consisting essentially of l-60% by weight of a hydrochlorofluoro- carbon, hydrofluorocarbon, or perfluoro- carbon halocarbon component having 2-4 carbons, a boiling point of 2545”C, and no flash point; l-30% of a nonflammable chlorinated solvent component with a boil- ing point of 80-130°C selected from per- chloroethylene, trichloroethylene, or mix- tures thereof; and l-40% of an oxygenated organic solvent component, which has a flash point over O’C, has a boiling point intermediate that of the other two compo- nents, and is selected from methanol, etha- nol, isopropanol, isopropyl acetate, dim-

0 he solution may be simpler than you think. At Greco Brothers we put our fifty years of experience ond

technical expertise to work: trofting affordoble tleoning systems which ore masterfully designed for your specific opplicotion.

Our Aqueous Cleaning Systems expertly utilize and reqtle water to remove every

l Thermal and Catalytic

l On Site Carbon

l Fixed Bed Concentrators

speck of foreign matter from the port being cleaned. And once the port is dean, one of our Hot Air Dryers or Fluid Displacement Drying Systems will remove the water-leaving the port free of film or spots.

For non-aqueous cleaning, we offer 0 complete line of Advanced Vapor Degreesing Systems [AVD] which provide the odvontages of stondord vapor degreosers, without threatening the environment.

So toll Greta Brothers today, and let us show you how simple the solution to your tleoning problem con be.

@ THERMTECH,INC. 300- 659-8271 l Fax: (713) 359-7550 l e-mail: sales@thermtech.com

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401/421-9306 fax 401/274-8910

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METAL FINISHING . JANUARY 1997

ethyl carblwte, n-pr qmnol. 7-hutmol, ethyl proprionate, n-propyl acetate, meth- ylpropylkett jne. dif-thylketone. n-bLty1 for- mate, isobu!anol. n-butanol, and mixtures thereof, saic‘ component\ and their propor- tions being chosen such that the blend has a substantially lower ozone depletion po- tential than 1, I &trichloro-I .2.2,-trlfluoro- ethane or I , I. I trichloroethane and, and when evaporated, has resultant vapor fiac- (ions and liquid fractions each having no l-lash point.

Plating Device Having Laminar Flow U.S. Patent 5314,258. May 7, 1996 O.J. Brinket and B.C. Brinkef. Hunfingfon Beach, Calif

An apparatus for providing a uniform flow of solution during electroplating of a substrate, comprising a container for hold- ing a plating bath, the container having an inlet; an inlet plate having an internal chan- nel, the channel in fluid connection with the inlet for conducting the solution con- taining a desired plating material; an insert plate having conical apertures for passing the electroplating solution from the insert

plate into the plating bath and for providing an even distribution of the electroplating solution into the plating bath; an anode: a tunnel plate having a tunnel through which the electroplating solution passes, the solu- tion having a laminar flow upon exiting the tunnel; a cathode; an outlet for expelling out of the plating bath the electroplating solutionl and a pump system for circulating the solution between the inlet and the out- let.

Sputtering Apparatus U.S. Patenf 5,514,259. May 7, 1996 J. Shiota et al, assignors fo Casio Computer Co 1 td., Tokyo

A sputtering apparatus comprising a pressure-resistant vessel; means for dis- charging gas from the vessel; means for supplying gas for sputtering into the vessel; a substrate disposed in the vessel to be formed with a film at least on one surface thereof; a target disposed opposite to the substrate and formed of a substance to be- come a material of the film to be coated on the substrate; and means for supplying a sputtering current to the target.

Apparatus for Simultaneous Ion Plating U.S. Patent 5,514,260. May 7, 1996 O.G. Sea, assignor to Samsung Elecfronics Co. Ltd., &won, Republic of Korea

An apparatus for simultaneous plating comprising a first chamber in which arc ion plating and HCD ion plating may be con- currently or selectively performed; a sec- ond chamber in which a sputtering plating may be performed; a vacuum pump con- nected to the first and second chambers; and two throttle valves each of which is connected to one of the two chambers.

Electroplating Silver-Tin Alloys U.S. Patent 5,514,261. May 7, 1996 G. Herklotz et a/., assignors to W.C. Heraeus GmbH, Hanau, Germany

An aqueous bath for the electrodeposi- tion of silver-tin alloys having a pH of 0 to 14 and comprising 120 g/L of silver as a soluble silver compound; 100 g/L of tin as a soluble tin compound; 450 g/L of at least one mercapto compound selected from the group consisting of mercaptoalkanecar- boxylic acids, mercaptoalkanesulfonic ac-

ibmu/et#ens evaitable, Synthetic end sealed cut POLYKNITL tack cloths for lowest lint.

Call for Samples & lnforma tion:

(800) 253-2863 BOND CORP. 2100 W. Fulton St., Chicago, IL 60612-2314 Tel: (312) 226-5535 l Fax: (312)226-6099

J$$ *us*

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If you have a waste treatment problem we will be happy to offer our services without charge for one day. Why? Because we have a world of experience (hundreds of systems). And a very broad proprietary product line. Recovery Systems for water reuse, for chemi- cal capture and reuse, electrowb ning, ion exchange systems, micro- filtration units. This array also allows us to design and supply the most upto- date total systems in the industry. So, that’s why the free day-what have you got to lose???

22 1 East Main Street, Milford, MA 0 1757 Tel: (SOS) 473-6800 n Fax: (508) 4734030

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