technicalnote - avantorinc.com · integrated circuits (al, sio 2) ... 6 rinse1 1:00 50 cdi c2 ......
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TechnicalnoteAluminum Application Guide
CLEANING AND SURFACE PREPARATION IN THE PRESENCE OF ALUMINUM
Mallinckrodt Baker, Inc. produces the J.T.Baker® brand of high purity chemicals for cleaning and surface preparation in a wide range of electronics manufacturing processes. The J.T.Baker line of microelectronic chemicals includes photoresist strippers and residue removers used in various applications, including: integrated circuits, � at panel displays, and MEMS.
Integrated Circuits (Al, SiO2)
FEOL BEOL Far-BEOL Flat Panel Displays Packaging MEMS
PRS™ Series • • • • •ALEG™ Series • • • • •REZI™ Series • • •
PRODUCTS
Our diverse line of performance products o� ers the versatility needed to meet the toughest challenges in cleaning processes. Whether you're removing bulk photoresist on a rework process or post etch process, or residual polymer after a post ash process, Avantor Performance Materials can help.
PRS Series
The PRS series of formulated products are high performance organic solvents developed to maximize the removal and complete dissolution of bulk photoresist from a patterned wafer or � at panel surface. Speci� cally designed for wet bench applications, the PRS series is also highly e� ective in batch spray applications.
ALEG Series
A versatile series of formulated high performance organic solvents and semi-aqueous components, the ALEG product line is suitable for both bulk photoresist removal and post ash residue and polymer removal. Speci� cally designed for wet bench applications, the ALEG series also has proven to be e� ective in batch spray applications.
REZI Series
An environmentally friendly line of residue removers that are greater than 80% aqueous, REZI products are formulated to deliver the most e� ective removal of etch/ash residues and sidewall polymers from metal and via structures. They are speci� cally designed for use in wet bench and single wafer tool applications.
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OPERATING GUIDELINES
Avantor Performance Materials recognizes the diverse cleaning challenges presented by the di� erent segments of the Microelectronics industry. The general operating guidelines below o� er a starting point to begin evaluating the use of J.T.Baker performance products in your speci� c application.
Process Equipment Selection Guidelines : Bulk Photoresist Removal
Wet Bench Batch Spray Single Wafer Tool
PRS Series • •ALEG Series • •REZI Series
Process Equipment Selection Guidelines : Ash Residue Removal
Wet Bench Batch Spray Single Wafer Tool
PRS Series • •ALEG Series • • •REZI Series • • •
Untreated
Untreated
Baker PRS™-3000, 65ºC
Baker ALEG™-380, 85ºC
Bath or Batch Spray60º tp 85º C
5-20 min
DI Rinse(No intermediate
rinse required)Dry
PROCESS INFORMATIONSuggested Bath Recipe
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Suggested Spray Recipe for a Three Manifold Semitool
Step # Step Name Time (min) RPM M1 M2 M3 Drain
1 RPMSTAB 0:10 50 C1
2 T2DRAIN 0:10 50 T2 C1
3 T2RECL 5–20 50 T2 T2
4 T1TOT2 0:10 50 T1 T2
5 PURGE1 0:05 50 N2 T2
6 RINSE1 1:00 50 CDI C2
7 PURGE1 0:05 50 N2 IW
8 RINSELO 1:00 300 CDI IW
9 RINSEHI 2:00 600 CDI IW
10 PURGE2 0:05 600 N2 IW
11 DRYHI 1:30 1200–1400 N2 IW
12 DRYLO 6:00 600 N2 IW
Suggested SEZ Single Wafer Spray Recipe
Step # Step Name Flow (L/min) RPM Time (s)
1 Chemical 0.8 540 30-120
2 No Chem 1700 3
3 DI water 0.8 600 30
4 N2 1700 Various
SUGGESTED SEZ SINGLE WAFER SPRAY RECIPEPRS Products
Compatibility Information PRS-1000 PRS-2000 PRS-3000
Temperature Substrate Etch Rates 85°C (A/min) 85°C (A/min) 85°C (A/min)
Cu <0.2 Not Compatible Not Compatible
SiN <0.5 <0.5 <0.5
Al <0.5 <0.5 <0.5
Ti <0.4 <0.4 <0.4
TiN <0.5 <0.5 <0.5
W <0.1 0.4 0.3
TEOS (PECVD) <0.5 0.6 <0.5
GaAs <1 6 X
Cr ‡ <1 <1
Pb/Sn ‡ ‡ ‡
Mo ‡ <1 ‡
ITO ‡ <1 ‡
‡ Available upon request
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ALEG Products
Compatibility Information ALEG-310 ALEG-355 ALEG-370 ALEG-380 ALEG-445 ALEG-625
Temperature Substrate Etch Rates
85°C (A/min) 85°C (A/min) 60°C (A/min) 85°C (A/min) 85°C (A/min) 45°C (A/min)
Cu 8.5 Not Compatible
Not Compatible 21Not Compatible
14.1Not Compatible
31.8Not Compatible
Not Compatible
SiN 0.3 <0.5 <0.5 0.3 0.02 <1@ 45°C, <1@ 65°C
SiC 0 X X <0.1 0 0.1
Ta ‡ ‡ ‡ ‡ 0.1 ‡
TaN ‡ ‡ ‡ ‡ 0.01 ‡
Al 0.83 0.5 1.1 1.8 <0.5 Not Compatible
Ti <0.4 <0.1 <0.5 <0.1 <0.5 <1
TiN <0.5 <0.1 <0.5 <0.1 <0.5 <1
W 0.3 <0.5 0.7 1.92 <0.5 <1
TEOS (PECVD) <1 <0.5 <0.5 0.1 <0.5 <1
GaAs <1 18 <0.5 13.5 5 X
Si X X <0.5 <0.1 <0.5 X
Au ‡ ‡ ‡ ‡ ‡ <0.1
Ag ‡ ‡ 0.1 @ 75°C ‡ ‡ ‡
Mo ‡ ‡ ‡ ‡ ‡ 2.2
ITO ‡ ‡ ‡ ‡ ‡ ‡
‡ Available upon request
REZI Products
Compatibility Information REZI-28 REZI-38 (neat) REZI-38 (20:1) REZI-39 REZI-68
Temperature Substrate Etch Rates
45°C (A/min) 45°C (A/min) 25°C/45°C (A/min) 45°C (A/min) 45°C (A/min)
Cu 3 9.6 @ 25°C 24.4 @ 45°C 0.20 @ 25°C 0.30 @ 45°C 1.4 7 @ 25°C 43 @ 45°C
SiN <1 <1 0.30 @ 25°C 0.05 @ 45°C <0.5 <0.5
SiC <1 <1@ 20°C <1@ 45°C 0 @ 25°C 0.26 @ 45°C 0.8 <0.5
Ta ‡ 0.13 0.30 @ 25°C 0 @ 45°C ‡ 0
TaN ‡ 0 0 @ 25°C 0 @ 45°C ‡ 0.01
Al 3 1321 0.84 @ 25°C 17.9 @ 45°C 11.3 0.71 @ 25°C 1.3 @ 45°C
Ti <1 0.1 0.10 @ 25°C 6.8 @ 45°C <0.5 0.03
TiN <0.5 0 0.85 @ 25°C 6.9 @ 45°C 2.9 <0.5 @ 25°C <0.5 @ 45°C
W <1 @ 23°C 1.9 10.6 @ 25°C 54.5 @ 45°C 42.8 <0.8 @ 25°C <1.4 @ 45°C
TEOS (PECVD) <1@ 23°C <1@ 45°C <1 0.15 @ 45°C <0.5 <1@ 25°C <1@ 45°C
GaAs 1 3 ‡ 2 6
Mo 2.8 3.7 ‡ Not Compatible 2.3
ITO ‡ ‡ ‡ ‡ ‡
‡ Available upon request
APPLICATION SUPPORT
Avantor Performance Materials highly quali� ed Applications Engineers are available to help you implement a total process solution utilizing J.T.Baker chemistries in your existing tools or a new facility. Evaluations can be conducted at your manufacturing site or at one of several Avantor Performance Materials application laboratories. For additional information,
contact us at 1-800-JTBAKER (800-582-2537) or at 1-908-859-9346. You can also e-mail us at [email protected].
Mailing Address:Avantor Performance Materials, Inc.222 Red School LanePhillipsburg, NJ 08865
On the Web:www.avantormaterials.com
Our Web site features ASK AVANTOR™, which includes live chat capabilities with customer service representatives.
Ordering, Information and Assistance:Customer Service and Technical Service
toll free: 800-582-2537 or 908-859-2151fax: 908-859-6905www.avantormaterials.com
Lit # MICROAPPALUMINUM
©2010 Avantor Performance Materials, Inc. All rights reserved.Mallinckrodt® is a trademark of Mallinckrodt Inc. Other trademarks are owned by Avantor Performance Materials, Inc. or its affi liates unless otherwise noted.
About Avantor™ Performance Materials — formerly Mallinckrodt BakerAvantor™ Performance Materials, formerly Mallinckrodt Baker, manufactures and markets high-performance chemistries and materials around the world under two well-known and respected brand names, J.T.Baker® and Mallinckrodt Chemicals®. These products are widely used in biotechnology and pharmaceutical production; in the manufacturing of semiconductors, fl at panel displays and photovoltaic cells; and in research, academic and quality control laboratories. Based in Phillipsburg, New Jersey (USA), Avantor™ is owned by an affi liate of New Mountain Capital, LLC. For additional information please visit www.avantormaterials.com or follow www.twitter.com/avantor_news
Worldwide Locations
Phillipsburg, NJ 9001: 2000 & 14001: 2004Paris, KY 9001: 2000Mexico City, Mexico 9001: 2000Deventer, Holland 9001: 2000 & 14001: 2004Selangor, Malaysia 9001: 2000
China: J.T. Baker Chemical Products Trading (Shanghai) Co., Ltd.Site A 14/F Xin Mei Union Square999 Pudong South RoadPudong New Area Shanghai, 200120 ChinaTel: 86 21 58777258 Fax:86 21 58777253 E-mail: [email protected]
Europe: Avantor Performance Materials, B. V.Teugseweg 20, 7418 AMDeventer, The NetherlandsTel: 31-570-687500 Fax: 31-570-687574E-mail: [email protected]
India: J.T. Baker India Private Limited425-426, Chintamani Plaza, Andheri Kurla RoadChakala, Andheri (East), Mumbai – 400 099Tel: +91-22-4215 2458 Fax: +91-22-4215 2465E-mail: [email protected]
Malaysia: Mallinckrodt Baker Sdn. Bhd.A-1201-2, 12th Floor, Kelana Brem Tower 1, Jalan SS7/15 (Jalan Stadium), Kelana Jaya47301 Petaling Jaya, Selangor, MalaysiaTel: 60-3-780-30378 Fax: 60-3-780-30405E-mail: [email protected]
Mexico: Mallinckrodt Baker S. A. de C. V.Plomo 2Fracc. Industrial Esfuerzo Nacional XalostocCP 55320 Ecatepec, Estado de Mexico, Mexico Tel: 5255-5699-0250 Fax: 5255-5755-2585E-mail: [email protected]
North America: Avantor Performance Materials, Inc.222 Red School LanePhillipsburg, NJ 08865Tel: 1-800-582-2537E-mail: www.avantormaterials.com
Korea: Mallinckrodt Baker International Inc.8th Floor, Wooduck Building 832-2 Yeoksam 1-dong, Gangnam-guSeoul, Korea, 135-750Tel: 82-2-2052-0481 Fax: 82-2-571-5401E-mail: [email protected]